Lithography simulation
Reproducing the process of image formation in the resist on a computer! Efficiently discovering optimal process conditions.
A "Lithography Simulator" is a tool that calculates the behavior of exposure equipment and the behavior of resist (a photosensitive organic material). By inputting parameters from the actual process, it is possible to reproduce the process of image formation in the resist on a computer and efficiently find suitable process conditions. The simulator allows for various settings similar to those in actual lithography processes. 【Optical System Input】 ■Illumination Shape ■Coherence Factor ■Mask Pattern ■Mask Element Attributes ■Numerical Aperture / Focus ■Aberration / Flare *For more details, please refer to the related links or feel free to contact us.
- Company：リソテックジャパン
- Price：Other
